Structure of the Buried Metal-Molecule Interface in Organic Thin Film Devices

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Standard

Structure of the Buried Metal-Molecule Interface in Organic Thin Film Devices. / Hansen, Christian Rein; Sørensen, Thomas Just; Glyvradal, Magni; Larsen, Jacob; Eisenhardt, Sara H.; Bjørnholm, Thomas; Nielsen, Martin Meedom; Feidenhans'l, Robert Krarup; Laursen, Bo Wegge.

I: Nano Letters, Bind 9, Nr. 3, 2009, s. 1052-1057.

Publikation: Bidrag til tidsskrift › Tidsskriftartikel › Forskning › fagfællebedømt

Harvard

Hansen, CR, Sørensen, TJ, Glyvradal, M, Larsen, J, Eisenhardt, SH, Bjørnholm, T, Nielsen, MM, Feidenhans'l, RK & Laursen, BW 2009, 'Structure of the Buried Metal-Molecule Interface in Organic Thin Film Devices', Nano Letters, bind 9, nr. 3, s. 1052-1057. https://doi.org/10.1021/nl803393m

APA

Hansen, C. R., Sørensen, T. J., Glyvradal, M., Larsen, J., Eisenhardt, S. H., Bjørnholm, T., Nielsen, M. M., Feidenhans'l, R. K., & Laursen, B. W. (2009). Structure of the Buried Metal-Molecule Interface in Organic Thin Film Devices. Nano Letters, 9(3), 1052-1057. https://doi.org/10.1021/nl803393m

Vancouver

Hansen CR, Sørensen TJ, Glyvradal M, Larsen J, Eisenhardt SH, Bjørnholm T o.a. Structure of the Buried Metal-Molecule Interface in Organic Thin Film Devices. Nano Letters. 2009;9(3):1052-1057. https://doi.org/10.1021/nl803393m

Author

Hansen, Christian Rein ; Sørensen, Thomas Just ; Glyvradal, Magni ; Larsen, Jacob ; Eisenhardt, Sara H. ; Bjørnholm, Thomas ; Nielsen, Martin Meedom ; Feidenhans'l, Robert Krarup ; Laursen, Bo Wegge. / Structure of the Buried Metal-Molecule Interface in Organic Thin Film Devices. I: Nano Letters. 2009 ; Bind 9, Nr. 3. s. 1052-1057.

Bibtex

@article{9c4f5aa001dd11deb05e000ea68e967b,
title = "Structure of the Buried Metal-Molecule Interface in Organic Thin Film Devices",
abstract = "By use of specular X-ray reflectivity (XR) the structure of a metal-covered organic thin film device is measured with angstrom resolution. The model system is a Langmuir-Blodgett (LB) film, sandwiched between a silicon substrate and a top electrode consisting of 25 {\AA} titanium and 100 {\AA} aluminum. By comparison of XR data for the five-layer Pb2+ arachidate LB film before and after vapor deposition of the Ti/Al top electrode, a detailed account of the structural damage to the organic film at the buried metal-molecule interface is obtained. We find that the organized structure of the two topmost LB layers (5 nm) is completely destroyed due to the metal deposition.",
author = "Hansen, {Christian Rein} and S{\o}rensen, {Thomas Just} and Magni Glyvradal and Jacob Larsen and Eisenhardt, {Sara H.} and Thomas Bj{\o}rnholm and Nielsen, {Martin Meedom} and Feidenhans'l, {Robert Krarup} and Laursen, {Bo Wegge}",
year = "2009",
doi = "10.1021/nl803393m",
language = "English",
volume = "9",
pages = "1052--1057",
journal = "Nano Letters",
issn = "1530-6984",
publisher = "American Chemical Society",
number = "3",

}

RIS

TY - JOUR

T1 - Structure of the Buried Metal-Molecule Interface in Organic Thin Film Devices

AU - Hansen, Christian Rein

AU - Sørensen, Thomas Just

AU - Glyvradal, Magni

AU - Larsen, Jacob

AU - Eisenhardt, Sara H.

AU - Bjørnholm, Thomas

AU - Nielsen, Martin Meedom

AU - Feidenhans'l, Robert Krarup

AU - Laursen, Bo Wegge

PY - 2009

Y1 - 2009

N2 - By use of specular X-ray reflectivity (XR) the structure of a metal-covered organic thin film device is measured with angstrom resolution. The model system is a Langmuir-Blodgett (LB) film, sandwiched between a silicon substrate and a top electrode consisting of 25 Å titanium and 100 Å aluminum. By comparison of XR data for the five-layer Pb2+ arachidate LB film before and after vapor deposition of the Ti/Al top electrode, a detailed account of the structural damage to the organic film at the buried metal-molecule interface is obtained. We find that the organized structure of the two topmost LB layers (5 nm) is completely destroyed due to the metal deposition.

AB - By use of specular X-ray reflectivity (XR) the structure of a metal-covered organic thin film device is measured with angstrom resolution. The model system is a Langmuir-Blodgett (LB) film, sandwiched between a silicon substrate and a top electrode consisting of 25 Å titanium and 100 Å aluminum. By comparison of XR data for the five-layer Pb2+ arachidate LB film before and after vapor deposition of the Ti/Al top electrode, a detailed account of the structural damage to the organic film at the buried metal-molecule interface is obtained. We find that the organized structure of the two topmost LB layers (5 nm) is completely destroyed due to the metal deposition.

U2 - 10.1021/nl803393m

DO - 10.1021/nl803393m

M3 - Journal article

C2 - 19199753

VL - 9

SP - 1052

EP - 1057

JO - Nano Letters

JF - Nano Letters

SN - 1530-6984

IS - 3

ER -

ID: 10735650